Atomic layer deposition of Co₃O₄ thin films using a CoI₂/O₂ precursor combinationROOTH, Marten; LINDAHL, Erik; HARSTA, Anders et al.Chemical vapor deposition (Print). 2006, Vol 12, Num 4, pp 209-213, issn 0948-1907, 5 p.Article

Atomic layer deposition of epitaxial and polycrystalline SnO₂ films from the SnI₄/O₂ precursor combinationSUNDQVIST, Jonas; TARRE, Aivar; ROSENTAL, Arnold et al.Chemical vapor deposition (Print). 2003, Vol 9, Num 1, pp 21-25, issn 0948-1907, 5 p.Article

Growth of SnO₂ thin films by atomic layer deposition and chemical vapour deposition : A comparative studySUNDQVIST, Jonas; JUN LU; OTTOSSON, Mikael et al.Thin solid films. 2006, Vol 514, Num 1-2, pp 63-68, issn 0040-6090, 6 p.Article

CVD of epitaxial SnO₂ films by the SnI₄/O₂precursor combinationSUNDQVIST, Jonas; OTTOSSON, Mikael; HARSTA, Anders et al.Chemical vapor deposition (Print). 2004, Vol 10, Num 2, pp 77-82, issn 0948-1907, 6 p.Article

Atomic layer deposition of Ta₂O₅ using the TaI₅ and O₂ precursor combinationSUNDQVIST, Jonas; HÖGBERG, Hans; HARSTA, Anders et al.Chemical vapor deposition (Print). 2003, Vol 9, Num 5, pp 245-248, issn 0948-1907, 4 p.Article

Proceedings of the 4th European Vacuum Conference and the 1st Swedish Vacuum MeetingHARSTA, Anders; SÖDERHOLM, Svante; KARLSSON, Ulf et al.Vacuum. 1995, Vol 46, Num 8-10, issn 0042-207X, 508 p.Conference Proceedings

Properties of HfO₂ thin films grown by ALD from hafnium tetrakis(ethylmethylamide) and waterKUKLI, Kaupo; RITALA, Mikko; JUN LU et al.Journal of the Electrochemical Society. 2004, Vol 151, Num 8, pp F189-F193, issn 0013-4651Article

Iodide-based atomic layer deposition of ZrO₂: Aspects of phase stability and dielectric propertiesFORSGREN, Katarina; WESTLINDER, Jorgen; JUN LU et al.Chemical vapor deposition (Print). 2002, Vol 8, Num 3, pp 105-109, issn 0948-1907Article

Epitaxial growth of TiO₂ films in a hydroxyl-free atomic layer deposition processSCHUISKY, Mikael; KUKLI, Kaupo; AARIK, Jaan et al.Journal of crystal growth. 2002, Vol 235, Num 1-4, pp 293-299, issn 0022-0248Article

Deposition of HfO₂ thin films in HfI₄-based processesFORSGREN, Katarina; HARSTA, Anders; AARIK, Jaan et al.Journal of the Electrochemical Society. 2002, Vol 149, Num 10, pp F139-F144, issn 0013-4651Article

Mobility variations in semiconducting Ag₂Se layersSOMOGYI, K; SAFRAN, G.Vacuum. 1995, Vol 46, Num 8-10, pp 1055-1058, issn 0042-207XConference Paper

Atomic layer chemical vapor deposition of TiO₂. Low temperature epitaxy of rutile and anataseSCHUISKY, Mikael; HARSTA, Anders; AIDLA, Aleks et al.Journal of the Electrochemical Society. 2000, Vol 147, Num 9, pp 3319-3325, issn 0013-4651Article

Reduction of water adsorption on technical surfaces in the atmosphereDOBROZEMSKY, R.Vacuum. 1995, Vol 46, Num 8-10, pp 789-792, issn 0042-207XConference Paper

Scanning tunneling microscopy of carbon- and sulfur-induced modifications of Ni(111) and Ni(110) surfacesBÄCKER, R; HÖRZ, G.Vacuum. 1995, Vol 46, Num 8-10, pp 1101-1104, issn 0042-207XConference Paper

Vacuum requirements in high power microwave tubesDAMMERTZ, G.Vacuum. 1995, Vol 46, Num 8-10, pp 785-788, issn 0042-207XConference Paper

Vacuum system for LHCGRÖBNER, O.Vacuum. 1995, Vol 46, Num 8-10, pp 797-801, issn 0042-207XConference Paper

Giant magnetoresistance in silver-based magnetic multilayersRODMACQ, B; MALLON, A.Vacuum. 1995, Vol 46, Num 8-10, pp 1185-1186, issn 0042-207XConference Paper

Arc sources of metallic plasma for coatings in vacuum and for high speed vacuum pumpingKARPOV, D.Vacuum. 1995, Vol 46, Num 8-10, pp 825-826, issn 0042-207XConference Paper

Atomic density changes in carbon due to carbon bombardmentLASZLO, J; DEAK, P.Vacuum. 1995, Vol 46, Num 8-10, pp 987-989, issn 0042-207XConference Paper

Lateral distribution of Schottky barrier height: a theoretical approachHORVATH, ZS J.Vacuum. 1995, Vol 46, Num 8-10, pp 963-966, issn 0042-207XConference Paper

Hafnium tetraiodide and oxygen as precursors for atomic layer deposition of hafnium oxide thin filmsAARIK, Jaan; SUNDQVIST, Jonas; AIDLA, Aleks et al.Thin solid films. 2002, Vol 418, Num 2, pp 69-72, issn 0040-6090Article

Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursorKUKLI, Kaupo; FORSGREN, Katarina; RITALA, Mikko et al.Journal of the Electrochemical Society. 2001, Vol 148, Num 12, pp F227-F232, issn 0013-4651Article

Helium leak testing on the steam condensator of a turbineHULEK, Z; MIKULIK, R.Vacuum. 1995, Vol 46, Num 8-10, pp 811-812, issn 0042-207XConference Paper

Position-sensitive atom probe study of precipitates in high speed steelLEISCH, M; KOZESCHNIK, E.Vacuum. 1995, Vol 46, Num 8-10, pp 1155-1158, issn 0042-207XConference Paper

Simulation of sharp needle due to electron bombardmentCZARCZYNSKI, W; MULAK, A.Vacuum. 1995, Vol 46, Num 8-10, pp 1117-1119, issn 0042-207XConference Paper